DK spundreding coating

Magnetron spundly coating

Alius forma PVD coating technology.

Plasma coating

Magnetron pullulationem est plasma coating processus quibus spundly materia est eiectus ex bombardment of ions ad scopum superficiem. In vacuo camera PVD coating apparatus est repleti inerti Gas, ut Argon. Applicando ad altum voltage, a meridiem est creatus, unde in acceleratione ions ad scopum superficiem et plasma coating. Et Argon-ions et eicere spundering materiae a scopum superficiem (spundering), unde in sputeding coating in products in fronte de scopum.

Reactive spundering

Saepe an additional Gas ut NITROGENIUM aut acetylene adhibetur, quod agere cum ejectus materia (reactivum sputter). A amplis spucted tunica est deduceretur cum hoc PVD coating technica. Magnetron technology valde commodum ornatu coatings (E.G. Ti, CR, ZR et ipsum Nitres), quia de sua lenis natura. In eadem commodum facit Magnetron spundly late propter tribtora coating in Books mercatis (E.G. CRN, CR2N et variis combinations cum DLC coating - Diamonds sicut Carboni coating).

Magnetica

Magnettron spundly est aliquantum alia ex communi spundly technology. Differentia est quod Magnetron spundly technology utitur magnetica agros ut ad plasma in fronte de scopum, intensifying bombardment of ions. A valde densa plasma est propter hoc PVD coating technology.

Moribus Magnetron spundreding technology:

• A aqua-refrigeratum scopum, sic paulo radialis calor generatur
• Fere aliqua metallicis scopum materia potest esse sputeded sine corrumpitur
• Non-PROLIXUS materiae potest esse sputeded per radio frequency (RF)

aut medium frequency (mf) Power

• Oxide coatings potest esse sputed (reactivum sputter)
• optimum iacuit uniformitatem
• Ipsum smooth spucted coatings (no droplets)
• Cathodes (ad II meter longum) potest in aliquo loco, ergo alta flexibilitate de spunding apparatu consilium

Incommodum Magnetron spundlying technology.