Quid est opus principium vacuum coating machina?

In agro de coating, in crassitudine film sample post coating est momenti factor afficiens ad perficientur de film. Unde cum aestimandis perficientur de film sample, necesse est temptare perficientur de film sample per diversas crassitudines. In casu de vacuo coating, hoc saepe requirit plures sample apparatu. Tamen sunt duo problems in parat exempla pro plures tempora: Uno modo, in statu instrumenti est diversus pro exemplaria crevit in diversas tempora, ut factor quod afficit ad perficientur de film sample non solum sit crassitudine; Secundo, in specimen necessitates ad vacuumed in vacuo coating experimentum. Obtinendae tempus consumens. Proventus sumptus de productio et probatio.

Ideo a multi-muneris Magnetron spundly coating ratio est provisum. Haec ratio est integrated a vacuo coating ratio et caestu arca ratio. Potest perficere tenuis film evaporatio in a excelsum vacuo evaporatio camera et excelsum puritatem iners Gas in caestu arca. Et repono et praeparatio exempla et deprehendatur exempla post evaporatio sunt in atmosphaera. The combination of evaporation coating and glove box realizes the fully enclosed production of evaporation, encapsulation, testing and other processes, so that the entire film growth and device preparation process is highly integrated in a complete controllable environment atmosphere system, eliminating the organic large-area circuit preparation process The influence of unstable factors in the atmospheric environment guarantees the preparation of high-performance, large-area organic Optoelectronic cogitationes et circuits.

Pelagus ad multifunctional Magnetron spundly coating system: solebant parare variis metallum films, semiconductor films, Dielectric films, Magnetron films, optical films, superconducens films.