Quid est differentia inter evaporative coating et spundly coating?- Ningbo Danko Vacuum Technology Co., Ltd.

Quid est differentia inter evaporative coating et spundly coating?

Vacuum evaporation film is to heat the material to be evaporated to a certain temperature by resistance heating or electron beam et laser bombardment in an environment with a vacuum degree of not less than 10-2Pa, so that the thermal vibration energy of molecules or atoms in the material exceeds the surface. Ergo numerus moleculis vel atomis evaporationem vel sublimari et deposita directe subiectum formare tenuis amet. Ion sputtering coating is to use the high motion of positive ions generated by gas discharge under the action of an electric field to bombard the target as the cathode, so that the atoms or molecules in the target escape and deposit on the surface of the workpiece to be plated, forming the required film.

Et plerumque solebant pro vacuo evaporation coating est resistentia calefacit modum, quae habet commoda simplex structuram de calefactio fonte, humilis sumptus et convenient operationem. Electron trabem calefacere et laser heating potest vincere ad defectum resistentiae calefacit. In electronia trabem calefacere, a focused electron trabem ad directe calor emittebat materia, et motu industria electronicum trabem fit scelerisque industria ad evanescere materiam. Laser hercle utitur summus potentia laser ut calefactio fonte, sed ex princeps sumptus of summus potentia lasers, quod non solum potest esse in paucis research laboratorios.

Spulged technology differt a vacuo evaporation technology. "Spulgating" refertur ad phaenomenon in quibus energetic particulas bombard superficie corporis (target), causing solidum atomorum vel moleculis eiectus a superficiem. De Eijied particulas in nuclei status, saepe vocatur spucted atomis. Et sputlying particulas usus est ad bombarding in scopum potest esse electrons, ions aut neutrum particulas, quod ions sunt facile accelerato sub an electrica agro ad obtinendum requiritur motu particulas, ita sunt plerumque usus est ut bombarding. Et sputlying processus fundatur super meridiem, id est, quod spundering ions originate ex Gas defluxiones. Alia sputtering techniques uti diversis meridiem seminis modi. DC duo polus spundering utitur DC Missa; Tria polus sputtering utitur meridiem fluxum sustinetur a calidum cathode; RF sputtering utitur radio, frequency meridiem; Magnettron spundly utitur meridiem in potestate in potestate annularis magneticam agri. lux defluxiones.

Comparari vacuum evaporatio coating, spundly coating habet multa commoda. Exempli gratia, aliqua substantia potest esse sputed, praesertim elementa et componit cum altum liquescens punctum et humilis vapor pressura; bonum adhaesionem inter sputed film et subiectum; princeps film density; Controllable film crassitudine et bonum repeatability. Incommodum est apparatu magis eget et requirit summus voltage cogitationes. In addition, compositum ex evaporation modum et spundly modum dicitur Ion plating. Et utilitas huius modum est quod adeptus amet habet fortis adhaesionem inter subiectum et subiectum, et habet princeps depositionem rate et altum film density.

Founded in MMVII prior nomen Huahong vacuum technology, is professional Sinis continua Magnetron spundly machinis Suppliers and Continua Magnetron spundly machinis amet , Comprehendo sed non limitatur ad spunding systems, optical coating unitates, batch metallizers, physica vapor depositione (PVD) systems, durum et gerunt repugnant vacuum coating depositione et coating flexibile, ad-volumine machinarum ad coating flexibile subiecta. Et machinis sunt pro amplis de applications descripsit infra (sed non limited ad) Automotive, exornantur, durum coating, instrumentum & Metal Technology Technology et Ltd comprehendo Expands Applications et Wholeale continua Magnetron Colututri Machination et Lupum. Noster Company valde focus in post-Sales ministerium in domesticis et internationalis fora, providente accurate pars dispensando consilia et professional solutions in occursum customers need.