Quid est differentia inter evaporative coating et Magnetron pultertur?

Evaporatio coating est ad calefacere in scopum materia, ut superficiem components sunt evaporationem in forma nuclei coetus vel iones, et habitatores in superficiem in subiecto ad formare tenuis amet per film formationem (vagus structura - insulae).

In uniformitatem ex components de evaporation coating non facillimum est praestare, et specifica potestate factores sunt idem quod supra, sed propter limitata principle, uniformitatem components ex evaporation coating non est bonum, quod non-components de coating coating non-

Sputtering coating can be simply understood as bombarding the target with electrons or high-energy lasers, and sputtering the surface components in the form of atomic groups or ions, and finally depositing them on the surface of the substrate, going through a film-forming process, and finally forming a thin film.

Pleutlying coating dividitur in multis genera et differentia ex evaporation coating est quod spundering rate erit unum principalis parametri.

Nam laser pullulationem coating PLD in spunding coating, compositionem uniformitatem est ipsum facillimum esse, sed crassitudine uniformitatem atomi scalae est relative pauperum (quia est pulsuale (ora, et imperium est in orientation (ora, et imperium est in orientationis (ora, et imperium est in directe.

Magnetron spundly coating machina

Multi arcus Ion & spundly coatings potest deposita in lateque colorum. Et sonuit de coloribus potest esse adhuc auctus per introducendis reactivum vapores in camera per depositionem processus. Et late usus reactive vapores ad ornamentum coatings sunt NITROGENIUM, oxygeni, argon aut acetylene. Et exornantur coatings producuntur in quadam color range, fretus in metallum, ut-Gas Ratio in coating et structuram de coating. Et horum factores potest mutantur mutantur depositionem parametri.

Prior depositionem, partes purgari et superficies est liberum pulvis vel eget impudicitiis. Cum autem coating processus habet coepi, omnes pertinet processus parametri continue monitored et imperium per automatic computatrum imperium ratio.

• Substratum material: speculum, metallum (Carbon ferro, immaculatam ferro, aes), Ceramics, plastic, jewelry.

• structura type: vertical structuram, # CCCIV immaculatam ferro.

• coating film: multi-muneris metallum film, compositum amet, transparent PROMMIX film, reflectance-augendae amet, electro tutum film, exornantur amet.

• Film color: multi colore, gun nigrum, Titanium aureum color, Rose aureum color, immaculatam ferro color, purpura color, tenebris nigrum, tenebris hyacintho et alia colorum.

• Film Type: Stagni, CRN, ZRN, TICN, TICRN, tinc, tialn et DLC.

• Consumables in productio: Titanium, Chromium, Zirconium, ferrum, mixturae scopum; planum scopum, cylindricus scopum geminae scopum oppositum target.