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  • Commune Vacuum Terminology II

    1.Pa Pascal: International Unit of pressura, 1PA = 1n / M2. 2.torr Torr: unitas pressura, I Torr = 1/760 atm. Sinis PVD coating Systems Suppliers Atm vexillum atmosphaera: unitas pressu...

  • Commune vacuo terminology1

    Latin ambientium conditio: et temperatus est XX ℃, quod respectus humiditas est LXV% et atmosphaerica pressura is13225pa = 1013.25Mbar = 760Torr. PVD coating Systems Suppliers Lat...

  • A solidum superficiem est bombarded cum energetic particulas

    sputtering depositione Basic principia A solidum superficiem est bombarded cum energetic particulas (plerumque positivum ions accelerated per electrica agro). Freuttering de atomis et molecul...

  • Vacuum evaporatio plating

    Vacuum evaporatio plating Basic principia Vacuum evaporation coating est modus calefacere rudis materiae ad formare tenuis films in evaporatio continens in vacuo cubiculum ad atomorum vel mol...

  • Commune vacuum Leak Deprehensio Rerum

    Commune vacuum Leak Deprehensio Rerum High frequency scintilla Leak deprehensio Hoc modo est solum applicabilis Sinis multi-arcus Ion coating apparatus amet speculum va...

  • Vacuum Meter Leak Deprehensio modum

    Vacuum Meter Leak Deprehensio modum Lectiones de aliquo vacuo Gauges sunt ad genera vapores, ut Thermocouples et ionization vacuo gauges. Eligendo oportet Gas aut liquida ut Leakage Material, ha...

  • Commune vacuum Leak Deprehensio Rerum

    Vacuum Luto Signum Deprehensio modum Vacuum luto erit signari unum per unum suspectum Leak punctum, attendere ad mutationem de vacuo gradu. Si vacuo gradu Difficile film vacuum coating appar...

  • Commune vacuum Leak Deprehensio Rerum

    Leak Deprehensio ab Helium Missam Spectrometry Hoc technology est necessaria technology in agro vacuum Leak deprehensio. Est late in Leak deprehendatur propter eius altum Leak deprehensio effici...

  • Communi modi PVD Technology

    Communi modi PVD Technology Arcus Ion plating Et Arcus Cathodic Technology est ad depositum tenuis film materiae per ionizing in scopum materia in Ionic publica in vacuo conditionibus humilis...

  • Communi modi PVD Technology

    Communi modi PVD Technology RF (Radio Frequency) spundering Frequency de RF spundering est de 13.56 MHz. Non opus est calidum cathode et potest sputter ad inferioribus pressura et voltage. RF...

  • Communi modi PVD Technology

    Sputtering depositione Spulged est tenuis film depositione ars consociata cum Gas meridiem defluxiones. Sunt multi sputtering modi, ut dirige current spundering, RF sputter et reactivum sputter....

  • Vultus deinceps ad occurrens in Gujarat, India!

    Post menses de labore, nostrum Indian agente welcome duo DANCO vacuum coating machinis (Pandam machinis). Et incipiam ministerium in August. Plasma coating Machina Suppliers De July 25th a...